AsH3 is a toxic and flammable gas. It is used for solar cells, polysilicon, N-type doping process of GaAs diodes, as well as CVD (Chemical Vapor Deposition) process, epitaxy, and ion implantation or diffusion. In addition, it can be used in the growth of GaAs and other III-V semiconductor materials.
PH3 is a toxic and flammable gas. It is used for solar cells, polysilicon, N-type doping process of GaAs diodes, as well as CVD (Chemical Vapor Deposition) process, epitaxy, and ion implantation or diffusion.
H2Se is a toxic and flammable gas. It can be used for epitaxy, ion implantation and doping of solar cells, semiconductor and Integrated Circuit (IC) production, and the production of infrared materials like(e.g. ZnSe) as raw materials.
GeH4 is a flammable and toxic gas. It can be used for as a chemical reagent, and for high-purity germanium production. It can be used for solar cells, Silicon/Germanium devices, and for ion implantation and doping processes in the field of semiconductor and photonic applications.