Sputtering Targets

Sputtering Targets

Sputtering Targets are mainly used in vacuum coating equipment to coat thin film layers by Physical Vapor Deposition (PVD) on a substrate to add new functions or create microscopic connections and functions as in Thin Film Transistors (TFT).

The variety of used materials for sputtering targets is very broad and depends on the final application, so that these targets an be made either by pure metals or by very complex alloys.

Vital Thin Film Materials (VTFM) is a manufacturer of planar and rotary sputtering targets in wide range of materials using all available technologies, including the most advanced technology, to guarantee the best performance.

Product Intro - ITO Sputtering Targets

Our high-purity and high-density ITO rotary and planar target, as well customized ITO tablet and Indium Oxide powders were developed to fully cover all customers’ requirements and are available till G13 or 4000mm length.

ITO is widely used for FPD, TP, Solar cells, LED, Low-E glass etc.

ITO is the most widely used transparent conductive oxide in displays, including TN-STN, TFT-LCD, OLED, Micro-LED, TP etc.

No matter if for TFT Array or CF, VTFM manufactures high performance ITO, as well as high-purity metal sputtering targets including Aluminum, Copper, Molybdenum, and Titanium.

End application: TV, computer, laptop, monitor, mobile phone, movable terminals, public displays, vehicle display etc.

VTFM products: ITO, Mo target, Al target, Cu target, Ti target.
Vital Materials provides a full range of the minor metal products. We can customize the purity, composition and forms for different industrial applications. Please contact us for more information.